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姓名：马旭 职称：教授 导师类型：博导 团队名称：光电传感与生物信息处理团队 邮箱：maxu@bit.edu.cn |
研究领域
主要研究领域为：先进集成电路制造技术、计算光刻、计算成像、智能光电图像处理、机器学习和深度学习
教育经历
2005年9月–2009年8月：特拉华大学电子与计算机工程专业博士学位
2001年9月–2005年7月：清华大学电子工程专业 学士学位
工作经历
2018年12月–至今：光电成像技术与系统教育部重点实验室 副主任
2017年10月–2018年2月：特拉华大学 访问教授
2014年12月–至今：北京理工大学光电学院 光电成像与信息工程研究所所长
2013年7月–至今：北京理工大学光电学院 教授
2010年10月–2013年7月：北京理工大学光电学院 副教授
2009年9月–2010年8月：美国加州大学伯克利分校电子工程与计算机科学系 博士后
学术成果
1.Xu Ma and Gonzalo R. Arce, Computational Lithography, Wiley & Sons, 2010（国际首部计算光刻专著）.
2.Shengen Zhang, Xu Ma*, Chaojun Huang, Fuli Wang, and Gonzalo R. Arce, “Model-driven optical proximity correction via hypergraph convolutional neural networks and its experimental demonstration,” Optics and Laser Technology, 183, 112199 (2025).
3.Chaojun Huang, Xu Ma*, Shengen Zhang, Mu Lin, Néstor Porras-Díaz, and Gonzalo R. Arce, “Block-based inverse lithography technology with adaptive level-set algorithm,” Optics and Laser Technology, 182, 112211 (2025).
4.Ziqi Li, Lisong Dong, Xu Ma, and Yayi Wei*, “Fast source mask co-optimization method for high-NA EUV lithography,” Opto-Electronic Advances 7(4), 44-54 (2024).
5.Wensheng Chen, Xu Ma*, and Shengen Zhang, “Bandwidth-aware fast inverse lithography technology using Nesterov accelerated gradient,” Optics Express 32(24), 42639-42651 (2024).
6.Junbi Zhang and Xu Ma*, “Fast diffraction model of lithography mask based on improved pixel-to-pixel generative adversarial network,” Optics Express, 31(15), 24437-24452 (2023).
7.Zhen Fang, Xu Ma*, Huifeng Pan, et. al, “Movement forecasting of financial time series based on adaptive LSTM-BN network,” Expert System with Application, 213, 119027 (2023).
8.Shengen Zhang, Xu Ma*, Zhen Fang, et. al, “Financial time series forecasting based on momentum-driven graph signal processing,” Applied Intelligence, 53(18), 20950-20966 (2023).
9.Shengen Zhang, Xu Ma*, and Junbi Zhang, “Fast inverse lithography approach based on model-driven graph convolutional network,” Optics Express, 31(22), 36451-36467 (2023).
10.Jiangbo Lyu, Tao Zhu, Yan Zhou, Zhenmin Chen, Yazhi Pi, Zhengtong Liu, Xiaochuan Xu, Ke Xu*, Xu Ma*, Lei Wang*, Zizheng Cao* and Shaohua Yu, “Inverse design for material anisotropy and its application for a compact X-cut TFLN on-chip wavelength demultiplexer,” Opto-Electronic Science, 2(11), 230038 (2023).
11.Yihua Pan and Xu Ma*, “Informatics-based computational lithography for phase-shifting mask optimization,” Optics Express, 30(12), 21282-21294 (2022).
12. Xu Ma*, Shengen Zhang, Yihua Pan, et. al, “Research and Progress of Computational Lithography,” Laser & Optoelectronics Progress, Highlight Paper, 59(9), 0922008 (2022).
13.Xianhong Zhao and Xu Ma*, “Off-axis aberration correction for a reflective coded aperture snapshot spectral imager,” Optics Letters, 47(5), 1202-1205 (2022).
14.Hao Zhang, Xu Ma*, Xianhong Zhao, et. al, “Compressive hyperspectral image classification using a 3D coded convolutional neural network,” Optics Express, 29(21), 32875-32891 (2021).
15.Qile Zhao, Xu Ma*, Gonzalo R. Arce, et. al, “Compressive X-ray tomosynthesis using model-driven deep learning,” Optics Express, 29(15), 24576-24591 (2021).
16.Xu Ma*, Yihua Pan, Shengen Zhang, et. al, “An informational lithography approach based on source and mask optimization,” IEEE Transactions on Computational Imaging 7, 32-42 (2020).
17.Xu Ma, Xianqiang Zheng, and Gonzalo R. Arce, “Fast inverse lithography based on dual-channel model-driven deep learning,” Optics Express 28(14), 20404-20421 (2020).
18.Hao Zhang, Xu Ma*, Daniel L. Lau, et. al, “Compressive spectral imaging based on hexagonal blue noise coded apertures,” IEEE Transactions on Computational Imaging 6, 749-763 (2020).
19.Chang Xu, Tingfa Xu*, Ge Yan, Xu Ma*, et. al, “Super-resolution compressive spectral imaging via two-tone adaptive coding,” Photonics Research 8(3), 395-411 (2020).
20.Xu Ma*, Gonzalo R. Arce, Zhiqiang Wang, et. al, “Compressive position and attitude estimation using ground-based beacon,” Journal of Guidance, Control, and Dynamics 40(10), 2630-2645 (2017).
21.Xu Ma* and Gonzalo R. Arce*, “Pixel-based simultaneous source and mask optimization for resolution enhancement in optical lithography,” Optics Express 17(7), 5783-5793 (2009).
22.Xu Ma* and Gonzalo R. Arce*, “PSM design for inverse lithography with partially coherent illumination,” Optics Express 16(24), 20126-20141 (2008).
23.Xu Ma* and Gonzalo R. Arce*, “Generalized inverse lithography methods for phase-shifting mask design,” Optics Express 15(23), 15066-15079 (2007).
教学工作
- 主讲《光电成像中的非线性信号处理》本科生课程
- 共同主讲《现代光电图像处理》研究生课程
- 曾共同主讲《高等光学》研究生课程
4. 曾共同主讲《科学交叉中的光学技术与仪器》研究生课程
荣誉奖励
1.入选教育部新世纪优秀人才
2.入选重庆英才创新创业示范团队
3.获评2021年“教育部产学合作协同育人项目”优秀项目案例
社会兼职
1.北京理工大学光学工程国家一级重点学科责任教授小组成员
2.IEEE Transaction on Computational Imaging 期刊编委、《Sensors》特刊编委
3.中国感光学会数字成像技术专委会委员、中国感光学会光刻材料与技术专委会委员、中国光学工程学会光电测试测量技术及应用专委会委员、中国光学学会光电技术专委会委员、中国仪器仪表学会光机电分会理事、中国微米纳米技术学会微纳执行器与微系统分会理事
4.IEEE/SPIE/OSA高级会员